Condensed Matter


Titanium Nitride: Sputter Modeling

Authors: A.S.Bhattacharyya, R. Praveen Kumar

A model for sputter based deposition of TiN films was developed by simulations. The rate of change of partial sputtering yield with coverage was considered. The deposition pressure and time were varied to get films of different thickness.

Comments: 02 Pages. Working Paper

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Submission history

[v1] 2015-10-19 14:00:53

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