A model for sputter based deposition of TiN films was developed by simulations. The rate of change of partial sputtering yield with coverage was considered. The deposition pressure and time were varied to get films of different thickness.
Comments: 02 Pages. Working Paper
[v1] 2015-10-19 14:00:53
Unique-IP document downloads: 125 times
Vixra.org is a pre-print repository rather than a journal. Articles hosted may not yet have been verified by peer-review and should be treated as preliminary. In particular, anything that appears to include financial or legal advice or proposed medical treatments should be treated with due caution. Vixra.org will not be responsible for any consequences of actions that result from any form of use of any documents on this website.
Add your own feedback and questions here:
You are equally welcome to be positive or negative about any paper but please be polite. If you are being critical you must mention at least one specific error, otherwise your comment will be deleted as unhelpful.